Mehdi DaneshPanah

Work Experience

ASML Optics, Wilton CT              Summer 2008

Extreme UV Lithography Research Team

• Participated in design of a double dark field scatterometry based particle detection system for integration with Reticle Inspection Module (RIM) for detection of 10-100 nm particles on a patterned EUV reticle surface at 22nm node.
  
  
• Determined the optimum polarization of probe beam as well as incidence/collection angles.
  
  
• Proposed an adaptive optical Fourier filter implemented by dynamic micro-mirror devices to reject strong diffraction orders from highly patterned reticle surface and improve SNR.
  
  
• Employed Monte Carlo implantation to predict the sedimentation rate for airborne particles on
  reticle surface, including the electrostatic interaction between charged particles and the reticle. The result were used to choose the required clean-room class for experiments.

Optical Design Team

• Collaborated with ASML lens designers to investigate numerical methods for optimizing non-neighboring asphere surfaces in deep UV lithography lens systems to achieve astigmatism-free performance.
  
  
• Programmed parameterized ray tracing model for multiple arbitrary surfaces in Mathematica.
  
  
• Solved the set of Differential Algebraic Equations (DAE) governing the ray propagation in a lens system with two unknown non-neighbor asphere surfaces.